The Effect of Power on Inductively Coupled Plasma Parameters

In this work, we studied the effect of power variation ​​on inductively coupled plasma parameters using numerical simulation. Different values ​​were used for input (750 W-1500 W), gas temperature 300K, pressure (0.02torr), 5 tourns copper coil and was produced at radio frequency (RF) 13.56 MHZ on above quartz chamber. For previous purpose, a computer simulation in two dimensions axisymmetric, based finite element method, implemented argon plasma. Based results were able to obtain with higher density, which represented by obtaining (electron electric potential, total power, number density ions, electron temperature, excited atoms) where high generated provides greater degree material processing, increases efficiency system. These may aid future research towards development more efficient optimization are atoms).